Layer deposition techniques have emerged as indispensable methods for constructing ultrathin films with precise control over thickness, composition and microstructure. Methods such as atomic layer ...

A technical paper titled “High throughput multiplexing reactor design for rapid screening of atomic/molecular layer deposition processes” was published by researchers at University of Washington. “An ...

A new technical paper titled “Molecular Layer Deposited Aluminum-Based Hybrid Resist for High-Resolution Nanolithography and Direct Ultra-High Aspect Ratio Pattern Transfer” was published by ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...